Patent · US Active

Radiation beam modification apparatus and method

US8351022B2 · kind B2 · utility

1Cited by

0References

19Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Wilhelmus Petrus De Boeij · Veldhoven, NL
Leon Martin Levasier · Hedel, NL

Key dates

Filing date	May 5, 2010
Grant date	Jan 8, 2013
Priority date	—
Expiry date	Jul 15, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7025
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.