Patent · US Active

Method for monitoring chamber cleanliness

US8361814B2 · kind B2 · utility

0Cited by

2References

17Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

Dror Shemesh · Hod HaSharon, IL
Michal Eilon · Mazkeret Batya, IL
Hen Doozli · Nes Ziona, IL
Ekaterina Rechav · Rehovot, IL
Eitan Binyamini · Nes Ziona, IL

Key dates

Filing date	Feb 9, 2006
Grant date	Jan 29, 2013
Priority date	—
Expiry date	Jan 23, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01L22/12
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.