Scanner based optical proximity correction system and method of use
US8365107B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 16, 2008 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Oct 5, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ1) is less than a predetermined criteria (ε1). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.