Shower head and substrate processing apparatus
US8366828B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2009 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Feb 27, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A shower head is provided in a processing chamber for processing a substrate therein to face a mounting table for mounting thereon the substrate and formed of a laminated body in which a plurality of plate-shaped members are laminated. The shower head serves to supply one or more gases in a shower shape toward the substrate. The shower head includes a first gas supply unit for supplying a first gas toward the substrate through first gas injection openings provided in the laminated body, a second gas supply unit for supplying a second gas through second gas injection openings provided in the laminated body and a plurality of gas exhaust holes, formed through the laminated body, for exhausting a gas through a portion of the laminated body, the portion facing the mounting table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.