Removal of masking material
US8367555B2 · kind B2 · utility
14Cited by
5References
38Claims
0Family size
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Inventors
Key dates
| Filing date | Dec 11, 2009 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | May 22, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.