Patent · US Active

Particle beam system

US8368019B2 · kind B2 · utility

1Cited by

9References

20Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Hubert Mantz · Neu-Ulm, DE
Rainer Arnold · Obertshausen, DE
Michael Albiez · Aalen, DE

Key dates

Filing date	Sep 28, 2011
Grant date	Feb 5, 2013
Priority date	—
Expiry date	Sep 28, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/256
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.