Lithographic apparatus and method for calibrating the same
US8368902B2 · kind B2 · utility
1Cited by
21References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 9, 2010 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Dec 9, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7019
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.