Patent · US Active

Maskless vortex phase shift optical direct write lithography

US8377633B2 · kind B2 · utility

0Cited by

2References

10Claims

0Family size

Assignee

LSI · US

Inventors

Nicholas K. Eib · San Jose, US
Ebo Croffie · Portland, US
Neal Callan · Lake Oswego, US

Key dates

Filing date	Oct 5, 2011
Grant date	Feb 19, 2013
Priority date	—
Expiry date	Oct 5, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70291
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems facilitate pattern transfer using such vortex phase shift exposure patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.