Substrate transfer apparatus and substrate treatment system
US8403601B2 · kind B2 · utility
5Cited by
12References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2010 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Jan 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T408/5612
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention is a transfer apparatus for a substrate, including a substrate housing container housing a substrate therein and having a transfer-in/out port for the substrate formed in a side surface thereof; a gas jet unit jetting a predetermined gas toward a rear surface of the substrate in the substrate housing container; and a control unit regulating a supply amount of the predetermined gas supplied from the gas jet unit to control the substrate in the substrate housing container to a predetermined height.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.