Patent · US Active

Method for the deposition of a ruthenium containing film

US8404306B2 · kind B2 · utility

1Cited by

22References

7Claims

0Family size

Assignee

L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

Christian Dussarrat · Tokyo, JP
Julien Gatineau · Ibaraki, JP

Key dates

Filing date	Sep 22, 2006
Grant date	Mar 26, 2013
Priority date	—
Expiry date	Sep 3, 2027

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/406
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The invention concerns the use of the ruthenium containing precursor having the formula(Rn-chd)Ru(CO)3,wherein:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.