Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
US8405817B2 · kind B2 · utility
Assignee
Inventors
- Marco Koert Stavenga
- Nicolaas Rudolf Kemper
- Martinus Hendrikus Antonius Leenders
- Paulus Martinus Maria Liebregts
- Johannes Catharinus Hubertus Mulkens
- Erik Henricus Egidius Catharina Eummelen
- Richard Moerman
- Michel Riepen
- Sergei Shulepov
- Gert-Jan Gerardus Johannes Thomas Brands
- Koen Steffens
- Jan Willem Cromwijk
- Ralph Joseph Meijers
- Fabrizio Evangelista
- David Bessems
- Hua Li
- Marinus Jochemsen
- Pieter Lein Joseph Gunter
- Franciscus Wilhelmus Bell
- Erik Witberg
- Marcus Agnes Johannes Smits
- Zhenhua Ma
Key dates
| Filing date | Feb 1, 2010 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Mar 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.