Reduced maintenance chemical oxide removal (COR) processing system
US8409399B2 · kind B2 · utility
5Cited by
11References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 2009 |
| Grant date | Apr 2, 2013 |
| Priority date | — |
| Expiry date | May 21, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective barrier. The second treatment chamber comprises a heat treatment chamber that provides a temperature-controlled chamber having a protective barrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.