Lithographic apparatus and method
US8416383B2 · kind B2 · utility
0Cited by
7References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2007 |
| Grant date | Apr 9, 2013 |
| Priority date | — |
| Expiry date | Dec 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.