Exposure apparatus, exposure method and device fabricating method
US8427628B2 · kind B2 · utility
0Cited by
5References
34Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 2, 2010 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Jan 25, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method for exposing a plate with an image of a pattern of a mask comprises: reciprocating the mask along X direction, synchronizing a movement of the mask and a movement of the plate to +X direction, projecting an image of a first pattern of the mask onto the plate as an erected image with respect to +X direction during a first period in which the mask that is reciprocating is moved in +X direction, and projecting an image of a second pattern of the mask onto the plate as an inverted image with respect to +X direction during a second period in which the mask that is reciprocating is moved in −X direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.