Patent · US Active

Projection objective for microlithography

US8436982B2 · kind B2 · utility

0Cited by

3References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Helmut Beierl · Heidenheim, DE
Heiko Feldmann · Aalen, DE
Jochen Hetzler · Aalen, DE
Michael Totzeck · Schwäbisch Gmünd, DE

Key dates

Filing date	Mar 12, 2010
Grant date	May 7, 2013
Priority date	—
Expiry date	Mar 12, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG02B21/33
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.