Patent · US Active

Systems and methods for adjusting a lithographic scanner

US8438507B2 · kind B2 · utility

5Cited by

9References

32Claims

0Family size

Assignees

NIKON CORPORATION · JP
NIKON PRECISION INC. · US

Inventors

Stephen P. Renwick · Moss Beach, US
Koichi Fujii · Oyama, JP

Key dates

Filing date	Sep 30, 2009
Grant date	May 7, 2013
Priority date	—
Expiry date	Feb 2, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/705
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A system and methods are provide for modeling the behavior of a lithographic scanner and, more particularly, a system and methods are provide using thresholds of an image profile to characterize through-pitch printing behavior of a lithographic scanner. The method includes running a lithographic model for a target tool and running a lithographic model on the matching tool for a plurality of different settings using lens numerical aperture, numerical aperture of the illuminator and annular ratio of a pattern which is produced by an illuminator. The method then selects the setting that most closely matches the output of the target tool.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.