Developing device, developing method and storage medium
US8440266B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2010 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Sep 4, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3028
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A developer nozzle supplies a developer onto the surface of a substrate rotating around a vertical axis, while a pure water nozzle supplies pure water onto the surface of the rotating substrate. The pure water nozzle is spaced apart from the developer nozzle and located on an outer side of the substrate with respect to the developer nozzle. The pure water restricts flow of the developer on the substrate and causes the developer to spread toward a clockwise side of the substrate when the substrate rotates in a clockwise direction. A liquid film containing the developer and the pure water is formed on the substrate. The developer nozzle and the pure water nozzle are spaced apart from each other to suppress splattering of the developer and the pure water due to collision of the developer with the pure water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.