Compound, salt, and radiation-sensitive resin composition
US8440384B2 · kind B2 · utility
2Cited by
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10Claims
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Key dates
| Filing date | Apr 14, 2010 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Apr 14, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A compound has a partial structure shown by a following formula (1),wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.