Semiconductor chips including passivation layer trench structure
US8440505B2 · kind B2 · utility
2Cited by
0References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2010 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Mar 6, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/3512
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated circuit including an active region a passive region and a cut line in the passive region includes a passivation layer that includes an outer nitride layer over an oxide layer. The integrated circuit also includes a crack stop below the passivation layer and in the passive region, and a solder ball in the active region. The passivation layer has a trench formed therein in a location that is further from the active region than the crack stop and closer to the active region than the cut line, the trench passing completely through the outer nitride layer and a least a portion of the way through the oxide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.