Method and apparatus for acquiring simultaneous and overlapping optical and charged particle beam images
US8440969B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2011 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Jan 5, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2445
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This disclosure relates to a method and apparatus for producing multiple pixel-by-pixel simultaneous and overlapping images of a sample in a microscope with multiple imaging beams. A scanning electron microscope, a focused ion-beam microscope, or a microscope having both beams, also has an optical microscope. A region of interest on a sample is scanned by both charged-particle and optical beams, either by moving the sample beneath the beams by use of a mechanical stage, or by synchronized scanning of the stationary sample by the imaging beams, or by independently scanning the sample with the imaging beams and recording imaging signals so as to form pixel-by-pixel simultaneous and overlapping images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.