Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
US8446578B2 · kind B2 · utility
5Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2009 |
| Grant date | May 21, 2013 |
| Priority date | — |
| Expiry date | Nov 16, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95692
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A defect inspection apparatus for inspecting a defect of a substrate as an object to be inspected comprises an illumination optical system for illuminating the substrate, a receiving optical system for receiving diffracted light from the substrate and a polarizing element provided in either one of the illumination optical system or the receiving optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.