Multivariable solver for optical proximity correction
US8448099B2 · kind B2 · utility
2Cited by
6References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2012 |
| Grant date | May 21, 2013 |
| Priority date | — |
| Expiry date | Oct 15, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.