Patent · US Active

Optical system for microlithography

US8456616B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Daniel Kraehmer · Aalen, DE
Wilhelm Ulrich · Aalen, DE
Matthias Manger · Neukochen, DE
Bernhard Gellrich · Aalen, DE

Key dates

Filing date	Apr 7, 2009
Grant date	Jun 4, 2013
Priority date	—
Expiry date	Mar 11, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70308
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.