Lithographic apparatus and device manufacturing method
US8472006B2 · kind B2 · utility
0Cited by
48References
15Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | May 8, 2009 |
| Grant date | Jun 25, 2013 |
| Priority date | — |
| Expiry date | Nov 9, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.