Patent · US Active

Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage

US8473237B2 · kind B2 · utility

2Cited by
3References
28Claims
0Family size

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Inventors

Key dates

Filing dateMar 18, 2010
Grant dateJun 25, 2013
Priority date
Expiry dateJan 11, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B21/042
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.