Method of patterning photosensitive material on a substrate containing a latent acid generator
US8475667B2 · kind B2 · utility
1Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2010 |
| Grant date | Jul 2, 2013 |
| Priority date | — |
| Expiry date | Jun 21, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24612
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a method of patterning a photosensitive material on a polymeric fill matrix comprising at least one latent photoacid generator; and a structure prepared according to said method. The method comprises:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.