Device manufacturing method, lithographic apparatus and a computer program
US8477287B2 · kind B2 · utility
1Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2008 |
| Grant date | Jul 2, 2013 |
| Priority date | — |
| Expiry date | May 20, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.