Monitoring apparatus and method particularly useful in photolithographically processing substrates
US8482715B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2010 |
| Grant date | Jul 9, 2013 |
| Priority date | — |
| Expiry date | Sep 28, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8867
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for determining at least two properties of a substrate, including a supporting plate configured to support the substrate, and a measurement device coupled to the supporting plate, including an illumination system configured to direct light toward a surface of the substrate, and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the substrate, wherein the measurement device is configured to generate one or more output signals in response to the detected light, and a control unit coupled to the measurement device and configured to determine a first property and a second property of the substrate from the one or more output signals, wherein the first property comprises a presence of macro defects on the substrate, and wherein the second property comprises overlay misregistration in the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.