Lithographic apparatus and device manufacturing method
US8482718B2 · kind B2 · utility
5Cited by
10References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 20, 2010 |
| Grant date | Jul 9, 2013 |
| Priority date | — |
| Expiry date | Apr 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of determining higher order distortions of a patterning device of a lithographic apparatus, and associated apparatus. The higher order distortions are measured using the transmission imaging device. In a main embodiment, enhanced reticles are used which may have additional alignment gratings in the perimeter, in the scribe lanes of the image field or in the image field itself.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.