Patent · US Active

Line edge roughness measuring technique and test structure

US8488128B2 · kind B2 · utility

19Cited by
3References
14Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 1, 2009
Grant dateJul 16, 2013
Priority date—
Expiry dateMar 1, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70616
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A test structure is presented test structure on a substrate for monitoring a LER and/or LWR effect, said test structure comprising an array of features manufactured with amplified LER and/or LWR effect.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.