Patent · US Active

Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates

US8492736B2 · kind B2 · utility

10Cited by
41References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 2010
Grant dateJul 23, 2013
Priority date
Expiry dateOct 14, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/131
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.