Apparatus for and method of withdrawing ions in EUV light production apparatus
US8492738B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2012 |
| Grant date | Jul 23, 2013 |
| Priority date | — |
| Expiry date | May 7, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.