Immersion lithography fluid control system regulating gas velocity based on contact angle
US8497973B2 · kind B2 · utility
7Cited by
14References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 2007 |
| Grant date | Jul 30, 2013 |
| Priority date | — |
| Expiry date | Jun 12, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet depends on a contact angle between the immersion liquid and the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.