Patent · US Active

Method for making a planar membrane

US8501026B2 · kind B2 · utility

0Cited by

5References

13Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Christophe Constancias · Sarcenas, FR
Bernard Dalzotto · Grenoble, FR
Frank Fournel · Meylan, FR
Philippe Michallon · Meylan, FR
Hubert Moriceau · Saint-Égrève, FR
Valerie Pouteau · Meylan, FR

Key dates

Filing date	Jun 17, 2010
Grant date	Aug 6, 2013
Priority date	—
Expiry date	Jul 15, 2030

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2201/017
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method for determining a minimum tension compensation stress which will have a membrane of a thickness of less than or equal to one micrometer, secured to a frame, having, in the absence of any external stress, a desired deflection. The membrane can be made as planar as possible in absence of any external stress, and its thickness can be less than or equal to one micrometer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.