System and method for voltage-based plasma excursion detection
US8502689B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2010 |
| Grant date | Aug 6, 2013 |
| Priority date | — |
| Expiry date | Oct 17, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention provides a system and method for the detection of plasma excursions, such as arcs, micro-arcs, or other plasma instability, during plasma processing by directly monitoring direct current (DC) bias voltage on an RF power electrode of a plasma processing chamber. The monitored DC bias voltage is then passed through a succession of analog filters and amplifiers to provide a plasma excursion signal. The plasma excursion signal is compared to a preset value, and at points where the plasma excursion signal exceeds the preset value, an alarm signal is generated. The alarm signal is then fed back into a system controller so that an operator can be alerted and/or the processing system can be shut down. In certain embodiments, multiple processing regions can be monitored by a single detection control unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.