Jian J. Chen
34Patents
12h-index
42Co-inventors
81Inventor score
Filing activity: Sep 10, 1997 → Feb 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6583572B2 | Inductive plasma processor including current sensor for plasma excitation coil | Electricity | 420 | Expired |
| US10950477B2 | Ceramic heater and esc with enhanced wafer edge performance | Electricity | 264 | Active |
| US6063234A | Temperature sensing system for use in a radio frequency environment | Physics | 258 | Expired |
| US6164241A | Multiple coil antenna for inductively-coupled plasma generation systems | Electricity | 135 | Expired |
| US6463875B1 | Multiple coil antenna for inductively-coupled plasma generation systems | Electricity | 64 | Expired |
| US8587321B2 | System and method for current-based plasma excursion detection | Electricity | 50 | Active |
| US8502689B2 | System and method for voltage-based plasma excursion detection | Electricity | 48 | Active |
| US9157730B2 | PECVD process | Physics | 46 | Active |
| US6155199A | Parallel-antenna transformer-coupled plasma generation system | Electricity | 39 | Expired |
| US7096819B2 | Inductive plasma processor having coil with plural windings and method of controlling plasma density | Electricity | 34 | Expired |
| US7094315B2 | Chamber configuration for confining a plasma | Electricity | 25 | Expired |
| US6872281B1 | Chamber configuration for confining a plasma | Electricity | 25 | Expired |
| US6028286A | Method for igniting a plasma inside a plasma processing reactor | Electricity | 10 | Expired |
| US9458537B2 | PECVD process | Physics | 8 | Active |
| US9816187B2 | PECVD process | Physics | 7 | Active |
| US6527912B2 | Stacked RF excitation coil for inductive plasma processor | Electricity | 3 | Expired |
| US10125422B2 | High impedance RF filter for heater with impedance tuning device | Electricity | 3 | Active |
| US10032608B2 | Apparatus and method for tuning electrode impedance for high frequency radio frequency and terminating low frequency radio frequency to ground | Electricity | 3 | Active |
| US9865431B2 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Electricity | 3 | Active |
| US9386680B2 | Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamber | Electricity | 2 | Active |
| US10347465B2 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Electricity | 2 | Active |
| US10128118B2 | Bottom and side plasma tuning having closed loop control | Electricity | 2 | Active |
| US10060032B2 | PECVD process | Physics | 2 | Active |
| US10793954B2 | PECVD process | Physics | 2 | Active |
| US10030306B2 | PECVD apparatus and process | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.