Dual resistance heater for phase change devices and manufacturing method thereof

US8513576B2 · kind B2 · utility

Assignee

• Micron Technology, Inc. · US

Inventors

• Yudong Kim · Cupertino, US
• Ilya V. Karpov · Portland, US
• Charles C. Kuo · Hillsboro, US
• Greg Atwood · Los Gatos, US
• Maria Santina Marangon · Cernusco sul Naviglio, IT
• Tyler Lowrey · San Jose, US

Key dates

• Filing date: Dec 28, 2010
• Grant date: Aug 20, 2013
• Expiry date: Aug 31, 2031

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10N70/882

Abstract

A dual resistance heater for a phase change material region is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface of the heater material relative to the remainder of the heater material. As a result, the portion of the heater material approximate to the phase change material region is a highly effective heater because of its high resistance, but the bulk of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device.