Lithographic apparatus and device manufacturing method
US8514365B2 · kind B2 · utility
5Cited by
4References
20Claims
0Family size
Assignee
Inventors
- Frederik Eduard De Jong
- Marcel Hendrikus Maria Beems
- Marinus Aart Van Den Brink
- Johannes Henricus Wilhelmus Jacobs
- Martinus Hendrikus Antonius Leenders
- Leon Martin Levasier
- Frits Van Der Meulen
- Joost Jeroen Ottens
- Koen Jacobus Johannes Maria Zaal
- Richard B. J. Droste
- Johannes Wilhelmus De Klerk
- Peter Franciscus Wanten
- Jan Cornelis Van Der Hoeven
- Edwin Cornelis Kadijk
- Marteijn De Jong
- David Lucien Anstotz
Key dates
| Filing date | Jun 1, 2007 |
| Grant date | Aug 20, 2013 |
| Priority date | — |
| Expiry date | Apr 4, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.