Patent · US Active

Imaging device in a projection exposure facility

US8514371B2 · kind B2 · utility

0Cited by

8References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Wolfgang Hummel · Dresden, DE
Juergen Fischer · Adelsheim, DE
Karl-Eugen Aubele · Geislingen an der Steige, DE
Erich Merz · Oberkochen, DE
Raoul Reiner · Pforzheim, DE
Klaus Rief · Aalen, DE
Stefan Schoengart · Ulm, DE
Markus Neumaier · Langenau, DE
Baerbel Trossbach · Aalen, DE
Ulrich Weber · Ulm, DE
Michael Muehlbeyer · Aalen, DE
Hubert Holderer · Oberkochen, DE
Alexander Kohl · Aalen, DE
Jochen Weber · Laufenbürg, DE
Johannes Lippert · Buch am Wald, DE
Thorsten Rassel · Wertingen, DE

Key dates

Filing date	Apr 28, 2011
Grant date	Aug 20, 2013
Priority date	—
Expiry date	Oct 24, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.