Protective coating for a plasma processing chamber part and a method of use
US8522716B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2009 |
| Grant date | Sep 3, 2013 |
| Priority date | — |
| Expiry date | Nov 15, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0213
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.