Chamber apparatus, extreme ultraviolet light generation system, and method for controlling the extreme ultraviolet light generation system
US8525140B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2012 |
| Grant date | Sep 3, 2013 |
| Priority date | — |
| Expiry date | Jun 12, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.