Periodic patterns and technique to control misaligment between two layers
US8525994B2 · kind B2 · utility
9Cited by
117References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 22, 2009 |
| Grant date | Sep 3, 2013 |
| Priority date | — |
| Expiry date | Oct 15, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.