Patterning of magnetic thin film using energized ions
US8535766B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2008 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Nov 28, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3365
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.