Patent · US Active

Method for manufacturing non-volatile magnetic memory

US8535952B2 · kind B2 · utility

117Cited by
51References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 29, 2008
Grant dateSep 17, 2013
Priority date
Expiry dateFeb 17, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10B61/22
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

In accordance with a method of the present invention, a method of manufacturing a magnetic random access memory (MRAM) cell and a corresponding structure thereof are disclosed to include a multi-stage manufacturing process. The multi-stage manufacturing process includes performing a front end on-line (FEOL) stage to manufacture logic and non-magnetic portions of the memory cell by forming an intermediate interlayer dielectric (ILD) layer, forming intermediate metal pillars embedded in the intermediate ILD layer, depositing a conductive metal cap on top of the intermediate ILD layer and the metal pillars, performing magnetic fabrication stage to make a magnetic material portion of the memory cell being manufactured, and performing back end on-line (BEOL) stage to make metal and contacts of the memory cell being manufactured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.