Patent · US Active

Electron beam source and method of manufacturing the same

US8536773B2 · kind B2 · utility

0Cited by

14References

22Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Wolfram Buehler · Karlsruhe, DE
Volker Drexel · Oberkochen, DE

Key dates

Filing date	Mar 30, 2011
Grant date	Sep 17, 2013
Priority date	—
Expiry date	Jun 20, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/24557
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.