Exposure apparatus and method for manufacturing device
US8537331B2 · kind B2 · utility
0Cited by
18References
50Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 29, 2008 |
| Grant date | Sep 17, 2013 |
| Priority date | — |
| Expiry date | Oct 23, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion exposure apparatus includes an optical member, a supply outlet that supplies a liquid to a space between an upper surface of the optical member and a movable object, and an annular member at least a portion of which is arranged around the optical member, the space between the upper surface of the optical member and the object being filled with the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.