Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

US8542346B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Guido Limbach · Aalen, DE
• Franz Sorg · Aalen, DE
• Armin Schoeppach · Aalen, DE
• Ulrich Weber · Ulm, DE
• Ulrich Loering · Schwäbisch Gmünd, DE
• Dirk Hellweg · Langenau, DE
• Peter Meyer · Beverungen, DE
• Stefan Xalter · Oberkochen, DE
• Jens Kugler · Heubach, DE
• Bernhard Gellrich · Aalen, DE
• Stefan Hembacher · Bobingen, DE
• Bernhard Geuppert · Lauchheim, DE
• Aksel Goehnermeier · Aalen, DE

Key dates

• Filing date: Mar 24, 2009
• Grant date: Sep 24, 2013
• Expiry date: Jul 14, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.