Method and apparatus for inspecting a surface of a substrate
US8547545B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2011 |
| Grant date | Oct 1, 2013 |
| Priority date | — |
| Expiry date | Dec 14, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8874
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides a method and apparatus for inspecting a surface of a substrate. The apparatus includes: a rotatable stage on which a substrate to be inspected is placed; an inspection optical system having an illumination light source for emitting light to a substrate placed on the stage and a detector for detecting light from the substrate which is irradiated with the light from the illumination light source; an A/D converter for amplifying and A/D converting signals output from the detector in the inspection optical system; and a defect detector for detecting defects in a surface of the substrate by processing signals output from the detector and converted by the A/D converter and classifying the defected defects. The defect detector extracts micro defects in the surface of the substrate by processing the signals output from the detector, and detects linear defects existing discretely in a linear region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.