Use of photoresist material as an interstitial fill for PZT printhead fabrication
US8550601B2 · kind B2 · utility
1Cited by
1References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 23, 2011 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Jun 16, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49401
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An ink jet printhead including a plurality of piezoelectric elements and a photosensitive interstitial layer which fills spaces between each adjacent piezoelectric element. The ink jet printhead can be formed using a simplified method to pattern the photosensitive interstitial layer, and to remove a diaphragm attach material which covers a plurality of openings through a diaphragm using laser ablation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.