Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal
US8552334B2 · kind B2 · utility
59Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2009 |
| Grant date | Oct 8, 2013 |
| Priority date | — |
| Expiry date | Aug 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.